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Introducing Word of the Week, a series designed to help you freshen up on industry and Lam-related terms! Our first term is Atomic Layer Deposition (ALD) — here’s how we use it at Lam: 💡 ALTUS® combines chemical vapor deposition and ALD to deposit highly conformal metal films, like molybdenum (Mo), ideal for advanced metallization applications. 💡 Striker® consists of our single-wafer ALD products, providing ultra-thin, conformal dielectric films with properties targeting critical solutions for
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Atomic Layer Deposition Principle - an Introduction to ALD
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The shift from 2D to 3D NAND calls for new approaches. Our ALTUS® Halo system provides advanced molybdenum ALD capabilities, supporting conformal, selective, and temperature-sensitive applications for next-generation memory and logic devices. Watch the video to see how it works. https://bit.ly/4mrZg3N | Lam Research Corporation
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