After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...

Researchers have developed a new theoretical model explaining one way to make black silicon. The new etching model precisely explains how fluorine gas breaks certain bonds in the silicon more often ...

Silicon nitride etch has been one of the foundations of semiconductor manufacturing for a number of years. Overall silicon (Si) etch rate is dictated by the combination of process temperature and H 2 ...

An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...

Demand for high power devices is increasing in several electronics applications, including automotive, industrial, data center, and energy industries. Today, power devices have to meet stringent ...

InP enables the manufacture of components that can operate at high frequencies allowing higher volumes of data. In particular it offers compelling advantages for laser diode manufacture delivering ...

Unlike lasers, thermal sources such as light-bulb filaments usually emit incoherent radiation in many directions over a wide range of wavelengths. However, Jean-Jacques Greffet of the Laboratoire EM2C ...

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...